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Filtros : "Jurczak, Malgorzata" Limpar

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1 - 6 (6 records)

  • Artigo de periodico

    Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation (2014)

    Nicoletti, Talitha; Santos, Sara Dereste dos; Martino, João Antonio ; Aoulaiche, Marc; Veloso, Anabela; Claeys, Cor ; Simoen, Eddy ; Jurczak, Malgorzata

    Source: Solid-State Electronics. Unidade: EP

    Subjects: TEMPERATURA, MICROELETRÔNICA

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    • ABNT

      NICOLETTI, Talitha et al. Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation. Solid-State Electronics, v. 91, p. 53-58, 2014Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2013.09.012. Acesso em: 12 maio 2024.

    • APA

      Nicoletti, T., Santos, S. D. dos, Martino, J. A., Aoulaiche, M., Veloso, A., Claeys, C., et al. (2014). Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation. Solid-State Electronics, 91, 53-58. doi:10.1016/j.sse.2013.09.012

    • NLM

      Nicoletti T, Santos SD dos, Martino JA, Aoulaiche M, Veloso A, Claeys C, Simoen E, Jurczak M. Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation [Internet]. Solid-State Electronics. 2014 ; 91 53-58.[citado 2024 maio 12 ] Available from: https://doi.org/10.1016/j.sse.2013.09.012

    • Vancouver

      Nicoletti T, Santos SD dos, Martino JA, Aoulaiche M, Veloso A, Claeys C, Simoen E, Jurczak M. Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation [Internet]. Solid-State Electronics. 2014 ; 91 53-58.[citado 2024 maio 12 ] Available from: https://doi.org/10.1016/j.sse.2013.09.012

  • Artigo de periodico

    Low-frequency noise assessment in advanced UTBOX SOI nMOSFETs with different gate dielectrics (2014)

    Santos, Sara Dereste dos; Martino, João Antonio ; Cretu, B; Strobel, V; Routoure, J.-M; Carin, R; Aoulaiche, Marc; Jurczak, Malgorzata; Claeys, Cor

    Source: Solid-State Electronics. Unidade: EP

    Subjects: TEMPERATURA, MICROELETRÔNICA, SILÍCIO

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    • ABNT

      SANTOS, Sara Dereste dos et al. Low-frequency noise assessment in advanced UTBOX SOI nMOSFETs with different gate dielectrics. Solid-State Electronics, v. 97, p. 14-22, 2014Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2014.04.034. Acesso em: 12 maio 2024.

    • APA

      Santos, S. D. dos, Martino, J. A., Cretu, B., Strobel, V., Routoure, J. -M., Carin, R., et al. (2014). Low-frequency noise assessment in advanced UTBOX SOI nMOSFETs with different gate dielectrics. Solid-State Electronics, 97, 14-22. doi:10.1016/j.sse.2014.04.034

    • NLM

      Santos SD dos, Martino JA, Cretu B, Strobel V, Routoure J-M, Carin R, Aoulaiche M, Jurczak M, Claeys C. Low-frequency noise assessment in advanced UTBOX SOI nMOSFETs with different gate dielectrics [Internet]. Solid-State Electronics. 2014 ; 97 14-22.[citado 2024 maio 12 ] Available from: https://doi.org/10.1016/j.sse.2014.04.034

    • Vancouver

      Santos SD dos, Martino JA, Cretu B, Strobel V, Routoure J-M, Carin R, Aoulaiche M, Jurczak M, Claeys C. Low-frequency noise assessment in advanced UTBOX SOI nMOSFETs with different gate dielectrics [Internet]. Solid-State Electronics. 2014 ; 97 14-22.[citado 2024 maio 12 ] Available from: https://doi.org/10.1016/j.sse.2014.04.034

  • Artigo de periodico

    Optimizing the front and back biases for the best sense margin and retention time in UTBOX FBRAM (2013)

    Almeida, Luciano Mendes; Sasaki, Kátia Regina Akemi; Caillat, Christian; Aoulaiche, Marc; Collaert, Nadine ; Jurczak, Malgorzata; Simoen, Eddy ; Claeys, Cor ; Martino, João Antonio

    Source: Solid-State Electronics Volume 90, December 2013, Pages 149-154. Unidade: EP

    Assunto: SIMULAÇÃO

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    • ABNT

      ALMEIDA, Luciano Mendes et al. Optimizing the front and back biases for the best sense margin and retention time in UTBOX FBRAM. Solid-State Electronics Volume 90, December 2013, Pages 149-154, v. 90, p. 149-154, 2013Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2013.02.038. Acesso em: 12 maio 2024.

    • APA

      Almeida, L. M., Sasaki, K. R. A., Caillat, C., Aoulaiche, M., Collaert, N., Jurczak, M., et al. (2013). Optimizing the front and back biases for the best sense margin and retention time in UTBOX FBRAM. Solid-State Electronics Volume 90, December 2013, Pages 149-154, 90, 149-154. doi:10.1016/j.sse.2013.02.038

    • NLM

      Almeida LM, Sasaki KRA, Caillat C, Aoulaiche M, Collaert N, Jurczak M, Simoen E, Claeys C, Martino JA. Optimizing the front and back biases for the best sense margin and retention time in UTBOX FBRAM [Internet]. Solid-State Electronics Volume 90, December 2013, Pages 149-154. 2013 ; 90 149-154.[citado 2024 maio 12 ] Available from: https://doi.org/10.1016/j.sse.2013.02.038

    • Vancouver

      Almeida LM, Sasaki KRA, Caillat C, Aoulaiche M, Collaert N, Jurczak M, Simoen E, Claeys C, Martino JA. Optimizing the front and back biases for the best sense margin and retention time in UTBOX FBRAM [Internet]. Solid-State Electronics Volume 90, December 2013, Pages 149-154. 2013 ; 90 149-154.[citado 2024 maio 12 ] Available from: https://doi.org/10.1016/j.sse.2013.02.038

  • Artigo de periodico

    On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs (2013)

    Santos, Sara Dereste dos; Nicoletti, Talitha; Martino, João Antonio ; Aoulaiche, Marc; Veloso, Anabela; Jurczak, Malgorzata; Simoen, Eddy ; Claeys, Cor

    Source: IEEE Transactions on Electron Devices. Unidade: EP

    Subjects: SILÍCIO, FILMES FINOS, AVALIAÇÃO DE DESEMPENHO, TRANSISTORES

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    • ABNT

      SANTOS, Sara Dereste dos et al. On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs. IEEE Transactions on Electron Devices, v. 60, n. 1, p. 444-450, 2013Tradução . . Disponível em: https://doi.org/10.1109/ted.2012.2227749. Acesso em: 12 maio 2024.

    • APA

      Santos, S. D. dos, Nicoletti, T., Martino, J. A., Aoulaiche, M., Veloso, A., Jurczak, M., et al. (2013). On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs. IEEE Transactions on Electron Devices, 60( 1), 444-450. doi:10.1109/ted.2012.2227749

    • NLM

      Santos SD dos, Nicoletti T, Martino JA, Aoulaiche M, Veloso A, Jurczak M, Simoen E, Claeys C. On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs [Internet]. IEEE Transactions on Electron Devices. 2013 ; 60( 1): 444-450.[citado 2024 maio 12 ] Available from: https://doi.org/10.1109/ted.2012.2227749

    • Vancouver

      Santos SD dos, Nicoletti T, Martino JA, Aoulaiche M, Veloso A, Jurczak M, Simoen E, Claeys C. On the Variability of the Front-/Back-Channel LF Noise in UTBOX SOI nMOSFETs [Internet]. IEEE Transactions on Electron Devices. 2013 ; 60( 1): 444-450.[citado 2024 maio 12 ] Available from: https://doi.org/10.1109/ted.2012.2227749

  • Trabalho de evento

    On the variability of the low-frequency noise in UTBOX SOI nMOSFETs (2012)

    Simoen, Eddy ; Caño de Andrade, Maria Glória ; Almeida, Luciano Mendes; Aoulaiche, Marc; Caillat, Christian; Jurczak, Malgorzata; Claeys, Cor

    Source: Microelectronics technology and devices, SBMicro. Conference titles: International Symposium on Microelectronics Technology and Devices. Unidade: EP

    Assunto: MICROELETRÔNICA

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    • ABNT

      SIMOEN, Eddy et al. On the variability of the low-frequency noise in UTBOX SOI nMOSFETs. 2012, Anais.. Pennington: Escola Politécnica, Universidade de São Paulo, 2012. Disponível em: https://doi.org/10.1149/04901.0051ecst. Acesso em: 12 maio 2024.

    • APA

      Simoen, E., Caño de Andrade, M. G., Almeida, L. M., Aoulaiche, M., Caillat, C., Jurczak, M., & Claeys, C. (2012). On the variability of the low-frequency noise in UTBOX SOI nMOSFETs. In Microelectronics technology and devices, SBMicro. Pennington: Escola Politécnica, Universidade de São Paulo. doi:10.1149/04901.0051ecst

    • NLM

      Simoen E, Caño de Andrade MG, Almeida LM, Aoulaiche M, Caillat C, Jurczak M, Claeys C. On the variability of the low-frequency noise in UTBOX SOI nMOSFETs [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 maio 12 ] Available from: https://doi.org/10.1149/04901.0051ecst

    • Vancouver

      Simoen E, Caño de Andrade MG, Almeida LM, Aoulaiche M, Caillat C, Jurczak M, Claeys C. On the variability of the low-frequency noise in UTBOX SOI nMOSFETs [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 maio 12 ] Available from: https://doi.org/10.1149/04901.0051ecst

  • Trabalho de evento

    Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS (2012)

    Santos, Sara Dereste dos ; Nicoletti, Talitha; Aoulaiche, Marc; Martino, João Antonio ; Veloso, A; Jurczak, Malgorzata; Simoen, Eddy ; Claeys, Cor

    Source: Microelectronics technology and devices, SBMicro. Conference titles: International Symposium on Microelectronics Technology and Devices. Unidade: EP

    Assunto: MICROELETRÔNICA

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    • ABNT

      SANTOS, Sara Dereste dos et al. Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS. 2012, Anais.. Pennington: Escola Politécnica, Universidade de São Paulo, 2012. Disponível em: https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdf. Acesso em: 12 maio 2024.

    • APA

      Santos, S. D. dos, Nicoletti, T., Aoulaiche, M., Martino, J. A., Veloso, A., Jurczak, M., et al. (2012). Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS. In Microelectronics technology and devices, SBMicro. Pennington: Escola Politécnica, Universidade de São Paulo. Recuperado de https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdf

    • NLM

      Santos SD dos, Nicoletti T, Aoulaiche M, Martino JA, Veloso A, Jurczak M, Simoen E, Claeys C. Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 maio 12 ] Available from: https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdf

    • Vancouver

      Santos SD dos, Nicoletti T, Aoulaiche M, Martino JA, Veloso A, Jurczak M, Simoen E, Claeys C. Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 maio 12 ] Available from: https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdf
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